InternalSingle layer mirrors and multilayer mirrors for current and next-generation light sources
Speaker: Michael Störmer (GKSS Geesthacht)
Date: Thursday, 11 December 2008, 11:00-12:30
Location: room AER19/4.14
Current and next-generation light sources, for instance third generation synchrotron sources, FLASH and the future project XFEL require single-layer and multilayer mirrors with an optical length of more than one meter. At the GKSS research centre, a new sputtering system for the deposition of X-ray optics has been installed. This new system is able to manufacture mirrors with a maximum deposition length of 1.5m.
In this presentation we are going to show the first results of this challenging system. The mirror properties are investigated by means of X-ray reflectometry, transmission electron microscopy, atomic force microscopy and interference microscopy. The performance of the mirrors is analyzed, considering X-ray reflectivity, film thickness, micro-roughness and the uniformity of these properties over the whole deposition length. The results will be discussed and compared with former results.
